SIC PIN

Pure CVD silicon carbide pins are high-purity, fully dense silicon carbide precision components manufactured using chemical vapor deposition (CVD) technology, specifically designed for semiconductor wafer handling, support, and lifting applications. From raw materials to finished products, the entire process is free of sintering additives and impurities, offering ultra-high hardness, high-temperature resistance, plasma corrosion resistance, low outgassing, and minimal particle generation. It serves as a stable, clean, and long-lasting core consumable component in advanced processing equipment.

I. Product Features

High-purity CVD-SiC Material  
Free from sintering agents, pores, and impurities, with high purity and uniform structure, meeting stringent cleanliness requirements in semiconductor environments and significantly reducing wafer contamination risks.

Ultra-High Hardness and Wear Resistance  
Hardness approaching that of diamond, highly wear-resistant, impact-resistant, resistant to deformation and chipping, with service life far exceeding quartz, alumina, and stainless steel lift pins.

Excellent High-Temperature & Thermal Stability  
Capable of long-term operation under high-temperature, vacuum, and extreme thermal cycling conditions, without thermal deformation, cracking, or material degradation, ensuring consistent lifting precision.

Corrosion and Plasma Resistance  
Resistant to fluorine-based and chlorine-based plasmas, as well as acidic and alkaline cleaning environments, minimizing etching damage and particle generation, making it ideal for etching, PVD, CVD, oxidation, and diffusion equipment.

Low Outgassing & Low Contamination  
High surface smoothness and dense, pore-free structure result in extremely low outgassing rates under vacuum, eliminating metal and organic contamination, thereby safeguarding process yield.

Precision Dimensions and High Coaxiality  
Supports high-precision customization of outer diameter, length, taper, and head radius (R), with excellent dimensional consistency, effectively preventing wafer scratching, jamming, and eccentricity.

II. Typical Applications  
Wafer lifting, supporting, and positioning  
Etching tools, PVD, CVD, oxidation/diffusion, ALD, and other equipment  
Vacuum chambers and high-temperature processing environments  
8-inch / 12-inch advanced process and power semiconductor production lines  

III. Core Advantages Summary  
Pure CVD silicon carbide lift pins replace traditional ceramic and metal pins with higher purity, longer lifespan, lower contamination, and superior stability. They help improve equipment uptime, reduce maintenance costs, and ensure high wafer yield, making them the ideal choice for high-end semiconductor equipment and precision manufacturing processes.