TC temperature measurement

TC (Thermocouple) Temperature Measurement for Semiconductor Equipment

Semiconductor TC (Thermocouple) sensors work on the Seebeck effect, serving as critical temperature sensing components for front-end processes including etching, thin-film deposition, ion implantation, photolithography bake and RTP annealing. The product portfolio includes cartridge thermocouples for chamber & heater pedestal, vacuum feedthrough TC assemblies, and TC Wafer multi-point temperature measurement wafers. They perform precision temperature sensing and closed-loop thermal control inside vacuum plasma chambers, ESC electrostatic chucks, heater pedestals and diffusion furnaces.

Semiconductor manufacturing imposes strict requirements on particle contamination, metal impurity, thermal drift and RF noise immunity. Our TCs adopt high-purity insulation, low-outgassing sheath and EMI-shielded cables, with Type K/S/R/T thermocouple wires optional. TC Wafer integrates miniature thermocouple arrays on standard silicon wafers to capture full-area wafer temperature distribution synchronously. It directly measures real transient wafer surface temperature for tool qualification, chamber calibration, PM maintenance and recipe tuning, eliminating measurement deviation between pedestal reading and actual wafer temperature.

Key Features

1. Wide temperature range: -150℃ ~ 1200℃, covering cryogenic cooling to high-temperature annealing
2. Ultra-clean & low outgassing: Encapsulated with high-purity quartz/alumina/aluminum nitride, complying with SEMI standards to minimize metallic contamination
3. Plasma & RF interference resistance: Shielded mineral-insulated sheath and ungrounded junction for etch & PVD plasma chambers
4. Fast response & multi-point mapping: Custom sensing nodes on TC Wafer, millisecond sampling rate for thermal mapping & temperature profile analysis
5. Fully customizable: Probe diameter, cable length, vacuum feedthrough and sensor layout tailored to tool models, with calibration certificates supplied

Applications Dry Etch, PVD/CVD/ALD Thin Film Deposition, Ion Implantation, RTP Rapid Thermal Processing, Photolithography PEB Bake, Diffusion & Oxidation Furnace, ESC Pedestal Temperature Monitoring, Chamber Thermal Verification during Equipment PM

Typical part number：

1192-205758-11、1192-205867-13、1187-069893-13、PROFILE TC Centrotherm ID 178855、SPIKE TC Centrotherm ID 165144、profile 热偶（三段 S 型 / 6375 型扩散炉）、5SX-1000-360、5SX-Q1890-864、5SX-QS1845-522-2、5SX-Q2221-1022A、5SX-815-120、5BX-Q1803-813、5BX-QS1685-813、2575949-01、1113-928-01、2184-021040-11、5TOT000252、1187-143149-13、D4EX23558、D4EX18739-1、1187-069754-14、1187-058036-14、1187-058035-15、1187-079863-14、D4EX16741、KEK PROFILE TC NITRI、SM-140701-003、SM-140701-001、D7EX49262、D7EX49268、D7EX49239、D7EX42043、5TOT019542-M14CLN、5UOT310386、D7EX49262_M14QT'ZCLN、D7EX49268_M14QT'Z、518H-000344-12、518H-000344-12、5TOT019542、5UOT310386、5UOT189798、DJ-1206V、5TOT019542、D7EX51305、5UOT349400、D7EX59690、DD-1223V、DJ-1206V、5TOT019542、5UOT189798、PST-TC-001-QZ、PST-TC-002、PST-TC-001、2187-347006-11-POLY、518H-000082-11、218H-022500-12、518H-000540-14、518H-000535-16、518H-001302-11、INDY PLUS A-OUTER-3、INDYPLUSA-INNER-TC-0、518H-000540-14、518H-000535-16-M14_Q、2187-347006-11、388H-201438-12、388H-201355-12、518H-002216-11、2187-347006-11、218H-022500-11、218H-022856-1、388H-201355-12、388H-201438-12、P049-001-028、1530A-12-7090、CO1-K、0190-62380、0190-62379、300mm CVD SYM3、0190-63741、02-120403-00、0190-26834、0190-46163、0190-46164、0140-28534、AMAT Producer、AMAT Producer GT、TES Challenger、AMAT PRODUCER、TES Challenger、AMAT PRODUCER、TES Challenger、LK / REFLEXTION、0041-34191.....