6&8 Ceramic ESC

ESC is a core precision component used to hold wafers in semiconductor vacuum chambers, widely applied in plasma processes such as etching, PECVD, PVD, and ion implantation. It replaces mechanical clamps and vacuum chucks by securely fixing wafers under high-vacuum conditions, enabling temperature control and ensuring uniformity across the wafer during processing.

Innovative Structure: The dielectric layer is encapsulated within the ceramic, sintered as a single unit using high-temperature co-firing technology.

Performance Advantages:  
High Adsorption Force: The fully sintered ceramic sheet provides strong adsorption capability.  
High Stability: Exhibits exceptional stability during use.  
Long Service Life: Thanks to optimized materials and structure, product lifespan is significantly extended.  
Surface Characteristics: The ceramic surface is extremely smooth, resistant to dust and dirt accumulation, making it easy to clean and maintain.  
Material Stability: The inherent stability of ceramic material allows for diverse ESC product designs tailored to various wafer shapes, meeting customized requirements.