Graphite Electrode

Graphite electrodes are key core consumables for semiconductor plasma etching equipment. They serve as critical power-conducting and plasma-exciting components inside the etching chamber, stabilizing plasma distribution and ensuring uniform wafer etching. They effectively control etching consistency and pattern accuracy for chip fabrication.

Manufactured from high-purity fine-grain graphite, these electrodes feature excellent electrical conductivity, ultra-low impurity content and superior thermal shock resistance. They endure long-term plasma corrosion and high-temperature cyclic operation, minimizing particle generation and metallic contamination to meet strict semiconductor cleanliness standards.

To enhance durability, precision machining and professional SiC coating are applied. Such treatments reduce plasma erosion rates, extend service life and improve process stability, supporting high-precision and high-yield advanced semiconductor etching processes.

Common part numbers:

0200-09242、0200-09898、716-006711-001、716-011564-001.....