The crucible high-purity graphite gasket is a critical precision component used for crucible support, sealing cushioning, and thermal insulation and heat distribution in high-temperature processes such as vacuum evaporation, coating, and sintering.

Graphite electrodes are key core consumables for semiconductor plasma etching equipment. They serve as critical power-conducting and plasma-exciting components inside the etching chamber, stabilizing plasma distribution and ensuring uniform wafer etching. They effectively control etching consistency and pattern accuracy for chip fabrication.

High-purity graphite parts are core consumables for ion implantation (IMP) equipment in semiconductor manufacturing. With excellent thermal stability, low sputtering yield and good electrical conductivity, they can withstand high-energy ion bombardment and rapid temperature fluctuations inside the vacuum chamber.